Teknek has introduced the world’s first contact cleaning system for thin films that can be used in high vacuum. The Nanocleen vacuum system is ideal for use in roll-to-roll production of printed electronics, and offers excellent removal of nano-scale particles that could otherwise affect product yields. Teknek has already installed 16 systems at customer sites. Nanocleen was developed as part of Clean4Yield, an EU-funded project coordinated by Holst Centre. Nanocleen can be used in high vacuu...